@Article{UedaSPMORLP:2016:NeMePl,
               author = "Ueda, M{\'a}rio and Silva Junior, Ataide Ribeiro da and Pillaca, 
                         Elver Juan de Dios Mitma and Mariano, Samantha de F{\'a}tima 
                         Magalh{\~a}es and Oliveira, Rog{\'e}rio de Moraes and Rossi, 
                         Jos{\'e} Osvaldo and Lepienski, Carlos Maur{\'{\i}}cio and 
                         Pichon, Luc",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais 
                         (INPE)} and {Instituto Nacional de Pesquisas Espaciais (INPE)} and 
                         {Universidade Federal do Paran{\'a} (UFPR)} and {Institut 
                         Pprime}",
                title = "New method of plasma immersion ion implantation and also 
                         deposition of industrial components using tubular fixture and 
                         plasma generated inside the tube by high voltage pulses",
              journal = "Review of Scientific Instruments",
                 year = "2016",
               volume = "87",
               number = "1",
                pages = "013902",
                month = "Jan.",
             abstract = "A new method of Plasma Immersion Ion Implantation (PIII) and 
                         deposition (PIII and D) for treating industrial components in the 
                         batch mode has been developed. A metal tubular fixture is used to 
                         allocate the components inside, around, and along the tube, 
                         exposing only the parts of each component that are to be ion 
                         implanted to the plasma. Hollow cathode-like plasma is generated 
                         only inside the tube filled with the desired gas, by applying high 
                         negative voltage pulses to the hollow cylindrical fixture which is 
                         insulated from the vacuum chamber walls. This is a very convenient 
                         method of batch processing of industrial parts by ion 
                         implantation, in which a large number of small to medium sized 
                         components can be treated by PIII and PIII and D, very quickly, 
                         efficiently, and also at low cost.",
                  doi = "10.1063/1.4939013",
                  url = "http://dx.doi.org/10.1063/1.4939013",
                 issn = "0034-6748",
             language = "en",
           targetfile = "ueda.pdf",
        urlaccessdate = "27 abr. 2024"
}